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Re: issues with technology editing in version 7


From: Pierce Keating
Subject: Re: issues with technology editing in version 7
Date: Fri, 20 Apr 2007 18:09:03 -0700 (PDT)

Hello,
 
I've since found that the metal spacing error mentioned below does get detected by the DRC. I've also discovered that connecting to the transistor pins is better than I first thought, if I work with it, but I still haven't been able to avoid OVERLAP DRC errors.
 
Thank you,
Pierce

Pierce Keating <address@hidden> wrote:
Hello,
 
I have have been attempting to modify the mocmos library for the (MOSIS) AMI 1.5u SCNA ABN process. In the modified technology, I built an NPN transistor using a pbase layer, all created according to the SCNA layer map as described here: http://www.mosis.com/Technical/Layermaps/lm-scmos_scna.html
 
(I also removed the P-Well in the N-Transistor, since this process does not have a P-Well.)
 
There are at least two issues I have run into. First I deliberately included a metal1-metal1 spacing error to see if the DRC would detect the error but it doesn't. Also, I can't seem to connect to the pins of the npn transistor Node, when trying to use the node in a layout. Actually I can connect to them but not without a DRC metal1 spacing error. For other nodes, the layout editor seems to know to connect a metal1 arc to a metal1 port, and without DRC errors.
 
I've attached the libary to this email. If anyone would check it out and let me know what I'm doing wrong I would appreciate it very much.
 
Thank you,
Pierce Keating

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